Bazhin, A. I., Trotsan, A. N., Chertopalov, S. V., Stipanenko, A. A., & Stupak, V. A. (2012). The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films.
Chicago-Zitierstil (17. Ausg.)Bazhin, A. I., A. N. Trotsan, S. V. Chertopalov, A. A. Stipanenko, und V. A. Stupak. The Influence of the Magnetron Sputtering Regime and the Composition of the Reaction Gas on the Structure and Properties of ITO Films. 2012.
MLA-Zitierstil (8. Ausg.)Bazhin, A. I., et al. The Influence of the Magnetron Sputtering Regime and the Composition of the Reaction Gas on the Structure and Properties of ITO Films. 2012.
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