Bazhin, A. I., Trotsan, A. N., Chertopalov, S. V., Stipanenko, A. A., & Stupak, V. A. (2012). The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films.
Chicago Style (17th ed.) CitationBazhin, A. I., A. N. Trotsan, S. V. Chertopalov, A. A. Stipanenko, and V. A. Stupak. The Influence of the Magnetron Sputtering Regime and the Composition of the Reaction Gas on the Structure and Properties of ITO Films. 2012.
MLA (8th ed.) CitationBazhin, A. I., et al. The Influence of the Magnetron Sputtering Regime and the Composition of the Reaction Gas on the Structure and Properties of ITO Films. 2012.
Warning: These citations may not always be 100% accurate.