The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films

The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films

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Bibliographic Details
Date:2012
Main Authors: A. I. Bazhin, A. N. Trotsan, S. V. Chertopalov, A. A. Stipanenko, V. A. Stupak
Format: Article
Language:English
Published: 2012
Series:Physical surface engineering
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000908769
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Library portal of National Academy of Sciences of Ukraine | LibNAS
id open-sciencenbuvgovua-94145
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spelling open-sciencenbuvgovua-941452024-04-17T17:04:26Z The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films A. I. Bazhin A. N. Trotsan S. V. Chertopalov A. A. Stipanenko V. A. Stupak 1999-8074 2012 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000908769 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Physical surface engineering
spellingShingle Physical surface engineering
A. I. Bazhin
A. N. Trotsan
S. V. Chertopalov
A. A. Stipanenko
V. A. Stupak
The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
format Article
author A. I. Bazhin
A. N. Trotsan
S. V. Chertopalov
A. A. Stipanenko
V. A. Stupak
author_facet A. I. Bazhin
A. N. Trotsan
S. V. Chertopalov
A. A. Stipanenko
V. A. Stupak
author_sort A. I. Bazhin
title The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
title_short The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
title_full The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
title_fullStr The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
title_full_unstemmed The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
title_sort influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ito films
publishDate 2012
url http://jnas.nbuv.gov.ua/article/UJRN-0000908769
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first_indexed 2025-07-22T13:33:22Z
last_indexed 2025-07-22T13:33:22Z
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