The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
Збережено в:
| Дата: | 2012 |
|---|---|
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
2012
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| Назва видання: | Physical surface engineering |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000908769 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
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Library portal of National Academy of Sciences of Ukraine | LibNAS| id |
open-sciencenbuvgovua-94145 |
|---|---|
| record_format |
dspace |
| spelling |
open-sciencenbuvgovua-941452024-04-17T17:04:26Z The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films A. I. Bazhin A. N. Trotsan S. V. Chertopalov A. A. Stipanenko V. A. Stupak 1999-8074 2012 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000908769 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Physical surface engineering |
| spellingShingle |
Physical surface engineering A. I. Bazhin A. N. Trotsan S. V. Chertopalov A. A. Stipanenko V. A. Stupak The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films |
| format |
Article |
| author |
A. I. Bazhin A. N. Trotsan S. V. Chertopalov A. A. Stipanenko V. A. Stupak |
| author_facet |
A. I. Bazhin A. N. Trotsan S. V. Chertopalov A. A. Stipanenko V. A. Stupak |
| author_sort |
A. I. Bazhin |
| title |
The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films |
| title_short |
The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films |
| title_full |
The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films |
| title_fullStr |
The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films |
| title_full_unstemmed |
The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films |
| title_sort |
influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ito films |
| publishDate |
2012 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000908769 |
| work_keys_str_mv |
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2025-07-22T13:33:22Z |
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2025-07-22T13:33:22Z |
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