The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films

The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films

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Bibliographische Detailangaben
Datum:	2012
Hauptverfasser:	A. I. Bazhin, A. N. Trotsan, S. V. Chertopalov, A. A. Stipanenko, V. A. Stupak
Format:	Artikel
Sprache:	English
Veröffentlicht:	2012
Schriftenreihe:	Physical surface engineering
Online Zugang:	http://jnas.nbuv.gov.ua/article/UJRN-0000908769
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Library portal of National Academy of Sciences of Ukraine \| LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS

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