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Дослiдження розповсюдження температурних профiлiв в нестехiометричних плiвках SiOx при лазерному вiдпалi

Дослiдження розповсюдження температурних профiлiв в нестехiометричних плiвках SiOx при лазерному вiдпалi

The distribution of temperature profiles in nonstoichiometric SiOx films at the single pulse laser annealing has been studied theoretically. Temperature distributions on the surface of the SiOx films at irradiation by a laser beam with various intensities have been calculated. Temperature distributi...

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Bibliographic Details
Main Authors: Gavrylyuk, O. O., Semchuk, O. Yu., Steblova, O. V., Evtukh, A. A., Fedorenko, L. L.
Format: Article
Language:English
Published: Publishing house "Academperiodika" 2018
Subjects:
SiOx films
thermal conductivity
nanocrystals
Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018499
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Summary:The distribution of temperature profiles in nonstoichiometric SiOx films at the single pulse laser annealing has been studied theoretically. Temperature distributions on the surface of the SiOx films at irradiation by a laser beam with various intensities have been calculated. Temperature distributions on various depths of the SiOx films at irradiation by a laser beam with an intensity of 52 МW/cm2 have been found. During the laser pulse of 10 ns with an intensity of 52 MW/cm2, the temperature up to 1800 K can be reached on the specimen surface.

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