Дослiдження розповсюдження температурних профiлiв в нестехiометричних плiвках SiOx при лазерному вiдпалi
The distribution of temperature profiles in nonstoichiometric SiOx films at the single pulse laser annealing has been studied theoretically. Temperature distributions on the surface of the SiOx films at irradiation by a laser beam with various intensities have been calculated. Temperature distributi...
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| Date: | 2018 |
|---|---|
| Main Authors: | , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Publishing house "Academperiodika"
2018
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| Online Access: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018499 |
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| Journal Title: | Ukrainian Journal of Physics |