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Дослiдження розповсюдження температурних профiлiв в нестехiометричних плiвках SiOx при лазерному вiдпалi

The distribution of temperature profiles in nonstoichiometric SiOx films at the single pulse laser annealing has been studied theoretically. Temperature distributions on the surface of the SiOx films at irradiation by a laser beam with various intensities have been calculated. Temperature distributi...

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Bibliographic Details
Date:2018
Main Authors: Gavrylyuk, O. O., Semchuk, O. Yu., Steblova, O. V., Evtukh, A. A., Fedorenko, L. L.
Format: Article
Language:English
Published: Publishing house "Academperiodika" 2018
Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018499
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Journal Title:Ukrainian Journal of Physics

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Ukrainian Journal of Physics

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