Дослiдження структури i оптичних властивостей NiO нанолусочок. вирощування тонких плiвок Ni(OH)2 методом хiмiчного осадження

• Дата: 2018
• Автори: Abubakar, D., Mahmoud, N., Mahmud, Sh.
• Формат: Стаття
• Мова: English
• Опубліковано: Publishing house "Academperiodika" 2018
• Теми: annealing temperature; nanoflakes; thin film; chemical bath deposition; nickel oxide; -
• Онлайн доступ: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018611
• Назва журналу: Ukrainian Journal of Physics

Porous nickel oxide (NiO) nanoflakes are grown by the chemical bath deposition. The thin films are produced on an ITO/glass substrate and annealed at a variable temperature in a furnace. The structural and optical properties and the surface morphology of the thin films are studied and analyzed. FESEM results display the presence of nanoflakes with the structure of NiO/Ni(OH)2 in thin films that appear to increase in size with the annealing temperature. The sample grown at 300 ∘C is observed to have the highest surface area dimension. The EDX result reveals that the atomic ratio and weight of the treated sample has a non-stoichiometric value, which results in the p-type behavior of the NiO thin film. The result obtained by AFM indicates the highest roughness value (47.9 nm) for a sample grown at 300 ∘C. The analysis on XRD shows that the NiO nanoflakes possess a cubic structure with the orientation peaks of (111), (200), and (220). This appears with a stronger intensity at 300 ∘C. Likewise, XRD result approves the absence of the Ni(OH)2 peak at the annealing. For the optical band gap, the UV-Vis measurements give a lower value of 3.80 eV for 300 ∘C due to the highest crystallinity. The optimum temperature to synthesize high-quality NiO nanoflakes is 300 ∘C, which can be an important factor for good sensing devices.