Морфологія та оптичні властивості нанокластерів Ge на окисленій поверхні Si(001)
Germanium (Ge) nanoclusters are grown by the molecular-beam epitaxy technique on a chemically oxidized Si(100) surface at 700 ºC. X-ray diffraction and photocurrent spectroscopy demonstrate that the nanoclusters have the local structure of body-centered-tetragonal Ge, which exhibits an optical adsor...
Збережено в:
| Дата: | 2021 |
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| Автори: | , , , , , , , , , |
| Формат: | Стаття |
| Мова: | Ukrainian English |
| Опубліковано: |
Publishing house "Academperiodika"
2021
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| Теми: | |
| Онлайн доступ: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2021152 |
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| Назва журналу: | Ukrainian Journal of Physics |
Репозитарії
Ukrainian Journal of Physics| Резюме: | Germanium (Ge) nanoclusters are grown by the molecular-beam epitaxy technique on a chemically oxidized Si(100) surface at 700 ºC. X-ray diffraction and photocurrent spectroscopy demonstrate that the nanoclusters have the local structure of body-centered-tetragonal Ge, which exhibits an optical adsorptionedge at 0.48 eV at 50 K. Deposition of silicon on the surface with Ge nanoclusters leads to the surface reconstruction and the formation of a polycrystalline diamond-like Si coverage, while the nanoclusters core becomes a tetragonal SiGe alloy. The intrinsic absorption edge is shifted to 0.73 eV due to the Si–Ge intermixing. Possible mechanisms for nanoclusters growth are discussed. |
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