Структурні та морфологічні властивості нанометрових вуглецевих плівок, отриманих розпиленням графіту електронним променем

• Datum: 2023
• Hauptverfasser: Yukhymchuk, V.O., Dzhagan, V.M., Isaieva, O.F., Lytvyn, P.M., Korchovyi, A.A., Sabov, T.M., Lozinskii, V.B., Yefanov, V.S., Osokin, V.O., Kurapov, Yu.A.
• Format: Artikel
• Sprache: Ukrainian; English
• Veröffentlicht: Publishing house "Academperiodika" 2023
• Schlagworte: вуглецевi аморфнi плiвки; графiтоподiбнi плiвки; раманiвська спектроскопiя; електронне розпилення; XPS; АСМ
• Online Zugang: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2023217
• Назва журналу: Ukrainian Journal of Physics

Nanometer-thick carbon films on metal (copper, steel) and silicon substrates are obtained by the electron sputtering of graphite. The substrate temperature was varied from 350 to 600 оС with an increment of 50 оС, and the sputtering time from 1 to 10 s. The produced carbon films are studied using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), atomic force microscopy, and electron paramagnetic resonance (EPR) spectroscopy. From the analysis of Raman spectra, it is found that, at the temperatures of metal substrates below 550 оС, the carbon films formed on them are amorphous and have a graphite-like structure at higher substrate temperatures. At the same time, the films formed on silicon substrates at temperatures below 600 оС are amorphous. The results obtained from the Raman spectra correlate with the XPS data. It is shown that both the temperature and the substrate material (metal or silicon) affect the film morphology. As the substrate temperature increases from 350 to 600 оС, the average size of surface irregularities increases for carbon films on both the metal and silicon substrates. The EPR studies show that the available structural film defects, which are responsible for the manifestation of the so-called defect bands (D and D′ ones) in the Raman spectra, are not paramagnetic.