Механізми електропровідності напівпровідника Tm1 – xVxNiSb

The structural, thermodynamic, kinetic, and energy characteristics of the Tm1−xVxNiSb semiconductor are studied over T = 80–400 K and 0 ≤ x ≤ 0.10. The present study demonstrates that the crystal structure of TmNiSb is disordered and contains up to 2% of vacancies at the 4a crystallographic site (Tm...

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Bibliographic Details
Date:2024
Main Authors: Romaka, V.V., Romaka, V.A., Stadnyk, Yu.V., Romaka, L.P., Horyn, A.M., Demchenko, P.Yu., Pashkevych, V.Z.
Format: Article
Language:English
Ukrainian
Published: Publishing house "Academperiodika" 2024
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Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2023390
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Journal Title:Ukrainian Journal of Physics

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Ukrainian Journal of Physics
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Summary:The structural, thermodynamic, kinetic, and energy characteristics of the Tm1−xVxNiSb semiconductor are studied over T = 80–400 K and 0 ≤ x ≤ 0.10. The present study demonstrates that the crystal structure of TmNiSb is disordered and contains up to 2% of vacancies at the 4a crystallographic site (Tm atoms), which are gradually filled with V atoms up to x = 0.03 with further V for Tm substitution. The formation of two types of acceptor states with different depths of occurrence is experimentally determined: small acceptors generated by vacancies in the p-TmNiSb structure, and deep ones presumably formed by the vacancies at the Ni 4c site and correspond to the homogeneity region TmxNi1−xSb typical of other RNiSb half-Heusler phases. The results of the DFT modeling, including ground-state energy, distribution of the density of electronic states (DOS), and the band structure of Tm1−xVxNiSb, are consistent with experimental studies.