Структури і профілі тонких KY3F10:Ho3+ плівок, нанесених імпульсним лазерним впливом: Pulsed laser deposition of thin films

• Datum: 2018
• Hauptverfasser: Gemechu, N., Abebe, T.
• Format: Artikel
• Sprache: English
• Veröffentlicht: Publishing house "Academperiodika" 2018
• Online Zugang: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/71
• Назва журналу: Ukrainian Journal of Physics

Thin films of  phosphor have been successfully prepared by pulsed laser deposition using Nd-YAG laser (266 nm, pulse duration of 10 ns, repetition rate of 2Hz) on a  (100) silicon substrate in vacuum environment and for different target to substrate distances. The X-ray diffraction...