High frequency pulsation of high-voltage gas discharges by Chyhin, V.

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Nanotube formation on catalytic surface in plasma discharge by Maslov, V.I., Tretyakov, V.N., Azarenkov, N.A., Yegorov, A.M., Onishchenko, I.N.

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The influence of a DC electric field on the radio-frequency microdischarge by Bogatov, N.A.

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RF discharge in argon with cylindrical dust particles by Chutov, Yu.I., Goedheer, W.J., Kravchenko, O.Yu., Levada, G.I., Lisitchenko, T.E., Romanenko, R.O.

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Nanotube formation with controlled properties on catalytic surface by fullerene flow by Maslov, V.I., Skorobagat’ko, G.A., Yegorov, A.M., Onishchenko, I.N.

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The influence of nitrogen admixture on concentration of an electronic–excited helium atoms in atmospheric pressure glow discharge by Arkhipenko, V.I., Kirillov, A.A., Simonchik, L.V., Zgirouski, S.M.

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ARC discharge in a cross flow of gas by Chernyak, V.Ya., Naumov, V.V., Yukhymenko, V.V., Babich, I.L., Zrazhevskyy, V.A., Woewoda, Yu.V., Pashko, T.V.

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Features of high-current pulsed regimes in regimes in magnetron sputtering systems by Bizyukov, A.A., Kashaba, A.Ye., Romashchenko, E.V., Sereda, K.N., Tarasov, I.K., Abolmasov, S.N.

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Surface modification of Nd-Fe-B based materials with pulsed helium plasma streams by Bovda, A., Bovda, V., Byrka, O., Chebotarev, V., Garkusha, I., Matyushenko, N., Tereshin, V., Tortika, A., Brown, I.

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Influence of the magnetic field on particle dynamics in capillary discharge of the soft X-ray laser by Maslov, V.I., Tretyakov, V.N., Azarenkov, N.A., Borisko, V.N., Yegorov, A.M., Onishchenko, I.N.

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Microwave discharge as a source of light by Brodsky, Yu.Ya., Kovalev, N.F., Perminov, A.O., Shlepnev, S.P.

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Sterilization by plasma produced at REB outlet into atmosphere by Babich, E.M., Kiselev, V.A., Linnik, A.F., Maslov, V.I., Onishchenko, N.I., Sklyar, N.I., Uskov, V.V.

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Stady of the characteristics of barrier flat ozonizer with the use of pulse supply by Krasnyj, V.V., Klosovskij, A.V., Knysh, A.S., Taran, V.S., Shvets, O.M.

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The biomedical application and corrosion properties of implanted materials with protective coatings by Zykova, A.V., Luk’yanchenko, V.V., Safonov, V.I.

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Modernized technological accelerator with anode layer for ion cleaning by Dobrovol`s`kii, A.N., Goncharov, A.A., Pavlov, S.N., Panchenko, O.A., Protsenko, I.M.

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Influence of gas mixture with various mass numbers of gases on operation pressure range of plasma electron source with hollow cathode by Borisko, V.N., Petrushenya, A.A.

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Application of arc plasma for a deposition of superconducting films by Langner, J., Russo, R., Catani, L., Tazzari, S., Cirillo, M., Czaus, K., Merlo, V., Tazzioli, F., Proch, D., Koval, N.N., Lopatin, I.V.

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Critical energy in the cyclotron heating of ions in an ECR plasma source by Gutiérrez-Tapia, C., Hernández-Aguirre, O.

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Dusty discharges with secondary electron emission by Chutov, Yu. I., Goedheer, W.J., Kravchenko, O.Yu., Lavrov, O.A., Romanenko, R.

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Ion kinetics in an ECR plasma source by Gutiérrez-Tapia, C.

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