Deposition of borophosphosilicate glass films using the TEOS–dimethylphosphite–trimethylborate system von Turtsevich, A.S., Nalivaiko, O.Y.

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The Anisotropy Induced by a Magnetostriction in Exchange-Biased Two-Layer Films von Gomonay, O.V., Lukyanchuk, I.

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Final distribution density of material fragment sizes at slow fragmentation process von Brodskii, R.Ye., Virchenko, Yu.P.

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The First Find of Earthworm Parasite Plagiotoma lumbrici (Ciliophora, Plagiotomidae) in Ukraine von Neyter, R.Yu.

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Production of metal and dielectric films in a combined RF and arc discharge von Gasilin, V.V., Kunchenko, V.V., Nezovybat’ko, Yu.N., Taran, A.V., Taran, V.S., Tereshin, V.I., Shvets, O.M.

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Application of the modified plasma accelerator for amorphous diamond-like films production von Bizukov, A.A., Borisko, V.N., Kashaba, А.Е., Sereda, К.D., Yunakov, N.N., Zinov’ev, D.V.

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Plasma-aided surface technology for modification of materials referred to fire protection von Dineff, P., Gospodinova, D., Kostova, L., Vladkova, T., Chen, E.

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Optical Disc for Long-Term Data Storage Based on Chromium Film von Gorbov, I.V., Manko, D.Yu., Kryuchyn, A.A., Zichun Le, Minglei Fu, Pankratova, A.V.

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Electrophysical сharacteristics of LEDs based on GaN epitaxial films von Oleksenko, P.Ph., Sukach, G.A., Smertenko, P.S., Vlaskina, S.I., Bogoslovskaya, A.B., Spichak, I.O., Shin, D.H.

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Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering von Yakovin, S., Zykov, A., Dudin, S., Yefymenko, N.

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Метод Diff для имплементации стека отмены недавних действий пользователя von Масюк, А.Л.

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Peculiarities of EPR spectra of methyl radicals in quench-condensed krypton films von Dmitriev, Yu.A.

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Crystalline structure and polymorphism in powders and thin films of dibenzotetraaza[14]annulene von Udovitskiy, V.G.

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Evidence for high saturation of porous amorphous carbon films by noble gases von Krainyukova, N.V.

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Optical properties of ion implanted thin Ni films on lithium niobate von Lysiuk, V.O., Staschuk, V.S., Androsyuk, I.G., Moskalenko, N.L.

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Low-temperature deposition of silicon dioxide films in high-density plasma von Yasunas, A., Kotov, D., Shiripov, V., Radzionay, U.

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Charge characteristics of the MOS structures with oxide films containing Si nanocrystals von Begun, E.V., Bratus’, O.L., Evtukh, A.A., Kaganovich, E.B., Manoilov, E.G.

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Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics von Dmitruk, N.L., Mayeva, O.I., Korovin, A.V., Mamykin, S.V., Sosnova, M.V., Yastrubchak, O.B.

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Polarization and angular peculiarities of IR emission of thin film semiconductor structures von Kollyukh, O.G., Liptuga, A.I., Morozhenko, V.O., Pipa, V.I.

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Temperature dependence of luminescence pecularities in oxygen doped ZnTe films von Malushin, N.V., Skobeeva, V.M., Smyntyna, V.A.

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