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Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin von R. M. Rudenko, V. V. Voitovych, M. M. Krasko, A. H. Kolosiuk, A. M. Kraichynskyi, V. O. Yukhymchuk, V. A. Makara

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Behavior of hydrogen during crystallization of thin silicon films doped with tin von R. M. Rudenko, M. M. Krasko, V. V. Voitovych, A. H. Kolosiuk, Yu. Povarchuk, A. M. Kraichynskyi, V. O. Yukhymchuk, M. V. Voitovych, Ya. Bratus, I. A. Zaloilo

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