Photoluminescence of porous nc-Si—SiOx nanostructures treated by HF vapors

by V. A. Danko, I. Z. Indutnyi, K. V. Mykhailovska, Ye. Shepeliavyi
Published 2010

The influence of the periodic relief of the silicon substrate on polarization of photoluminescence observed in nc-Si–SiOx nanostructures

by K. V. Mykhailovska, V. I. Mynko, I. Z. Indutnyi, Ye. Shepeliavyi
Published 2017

Nickel-induced enhancement of photo-luminescence in nc-Si-SiOx nanostructures

by K. V. Michailovska, I. Z. Indutnyi, P. E. Shepeliavyi, V. A. Danko
Published 2014

Reversible photodarkening in composite As2S3/SiOx nanostructures

by V. A. Danko, I. Z. Indutnyi, O. F. Kolomys, V. V. Strelchuk, Ye. Shepeliavyi
Published 2011

Investigation of the surface plasmon-polaritons excitation efficiency on aluminum gratings, taking into account diffracted radiation

by I. Z. Indutnyi, V. I. Mynko, M. V. Sopinskyi, V. A. Danko, P. M. Lytvyn
Published 2021

Polarization memory of the luminescence related with Si nanoparticles embedded into oxide matrix

by K. V. Michailovska, I. Z. Indutnyi, O. O. Kudryavtsev, M. V. Sopinskyy, P. E. Shepeliavyi
Published 2015

Polarization conversion effect in obliquely deposited SiOx films

by M. V. Sopinskyy, I. Z. Indutnyi, K. V. Michailovska, P. E. Shepeliavy, V. M. Tkach
Published 2011

Photoinduced etching of thin films of chalcogenide glasses

by V. A. Danko, I. Z. Indutnyi, V. I. Mynko, Ye. Shepeliavyi, O. S. Lytvyn, M. V. Lukaniuk
Published 2012

Photostimulated reversible changes in the Ge-Se films as a base of resistive process

by I. V. Babiichuk, V. A. Danko, I. Z. Indutnyi, M. V. Lukaniuk, V. I. Mynko, Ye. Shepeliavyi
Published 2014

Photostimulated etching of germanium chalcogenide films

by V. A. Danko, I. Z. Indutnyi, V. I. Mynko, P. E. Shepeliavyi, M. V. Lukyanyuk, O. S. Litvin
Published 2012

Growth of the photonic nanostruc-tures using interference lithography and oblique deposition in vacuum

by I. Z. Indutnyi, V. I. Mynko, Ye. Shepeliavyi, M. V. Sopinskyi, V. M. Tkach, V. A. Danko
Published 2011

Photolithography on photostimulated reversible and transient structural changes in CHG

by V. A. Danko, I. Z. Indutnyi, M. V. Lukaniuk, V. I. Mynko, S. S. Ponomarov, Ye. Shepeliavyi, V. O. Yukhymchuk
Published 2015

Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation

by V. A. Danko, I. Z. Indutnyi, V. I. Mynko, S. V. Mamykin, Ye. Shepeliavyi, M. V. Lukaniuk, P. M. Lytvyn
Published 2019

Control of photoluminescence spectra of porous nc-Si-SiOx structures by vapor treatment

by V. A. Danko, Ya. Bratus, I. Z. Indutnyi, I. P. Lisovskyy, S. O. Zlobin, K. V. Michailovska, P. E. Shepeliavyi
Published 2010

Photoluminescence properties of silicon nanoparticlesinmultilayered (SiOx-SiOy)n structures with porousinsulatinglayers

by K. V. Mykhailovska, V. A. Danko, O. Y. Hudymenko, V. P. Kladko, I. Z. Indutnyi, Ye. Shepeliavyi, M. V. Sopinskyi
Published 2018

Nanostructured Au chips with enhanced sensitivity for sensors based on surface plasmon resonance

by I. Z. Indutnyi, Yu. V. Ushenin, V. I. Mynko, Ye. Shepeliavyi, M. V. Lukaniuk, A. A. Korchovyi, R. V. Khrystosenko
Published 2017

Influence of trap states on the kinetics of luminescence and induced light absorption by Si nanoparticles in a SiO2 matrix at their excitation with femtosecond laser pulses

by V. M. Kadan, I. Z. Indutnyi, V. A. Danko, Ye. Shepeliavyi, I. M. Dmytruk, P. I. Koreniuk, I. V. Blonskyi
Published 2013

Nanostructured Au chips with enhanced sensitivity for sensors based on surface plasmon resonance

by I. Z. Indutnyi, Yu. V. Ushenin, V. I. Mynko, P. E. Shepeliavyi, M. V. Lukaniuk, A. A. Korchovyi, R. V. Khrystosenko
Published 2017

Influence of trap states on the kinetics of luminescence and induced light absorption by Si nanoparticles in a SiO2 matrix at their excitation with femtosecond laser pulses

by V. M. Kadan, I. Z. Indutnyi, V. A. Danko, P. E. Shepelyavyi, I. M. Dmitruk, P. I. Korenyuk, I. V. Blonsky
Published 2013

Formation of submicron periodic plasmon structures of large area by using the interference lithography method with vacuum photoresists

by V. A. Danko, M. L. Dmytruk, I. Z. Indutnyi, S. V. Mamykin, V. I. Mynko, P. M. Lytvyn, M. V. Lukaniuk, Ye. Shepeliavyi
Published 2015