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Formation of submicron periodic plasmon structures of large area by using the interference lithography method with vacuum photoresists

Formation of submicron periodic plasmon structures of large area by using the interference lithography method with vacuum photoresists

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Bibliographic Details
Main Authors: V. A. Danko, M. L. Dmytruk, I. Z. Indutnyi, S. V. Mamykin, V. I. Mynko, P. M. Lytvyn, M. V. Lukaniuk, Ye. Shepeliavyi
Format: Article
Language:English
Published: 2015
Series:Optoelectronics and Semiconductor Technique
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0001061487
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Internet

http://jnas.nbuv.gov.ua/article/UJRN-0001061487

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