Relaxation of photodarkening in SiO-As₂(S,Se)₃ composite layers von Indutnyi, I.Z., Shepeliavyi, P.E., Indutnyi, V.I.

Volltext

Nickel-induced enhancement of photoluminescence in nc-Si–SiOx nanostructures von Michailovska, K.V., Indutnyi, I.Z., Shepeliavyi, P.E., Dan’ko, V.A.

Volltext

Effect of acetone vapor treatment on photoluminescence of porous nc-Si–SiOx nanostructures von Indutnyi, I.Z., Michailovska, K.V., Min’ko, V.I., Shepeliavyi, P.E.

Volltext

Polarization conversion effect in obliquely deposited SiOx films von Sopinskyy, M.V., Indutnyi, I.Z., Michailovska, K.V., Shepeliavyi, P.E., Tkach, V.M.

Volltext

Polarization memory of photoluminescence related with Si nanoparticles embedded into oxide matrix von Michailovska, K.V., Indutnyi, I.Z., Kudryavtsev, O.O., Sopinskyy, M.V., Shepeliavyi, P.E.

Volltext

The effect of surface plasmon-polaritons on the photostimulated diffusion in light-sensitive Ag–As₄Ge₃₀S₆₆ structures von Indutnyi, I.Z., Mynko, V.I., Sopinskyy, M.V., Dan’ko, V.A., Lytvyn, P.M.

Volltext

Photostimulated etching of germanium chalcogenide films von Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Shepeliavyi, P.E., Lukyanyuk, M.V., Litvin, O.S.

Volltext

Controlling the photoluminescence spectra of porous nc-Si–SiOx structures by vapor treatment von Dan’ko, V.A., Bratus, V.Ya., Indutnyi, I.Z., Lisovskyy, I.P., Zlobin, S.O., Michailovska, K.V., Shepeliavyi, P.E.

Volltext

Control of plasmons excitation by P- and S-polarized light in gold nanowire gratings by azimuthal angle variation von Dan'ko, V.A., Indutnyi, I.Z., Myn'ko, V.I., Mamykin, S.V., Shepeliavyi, P.Ye., Lukaniuk, M.V., Lytvyn, P.M.

Volltext

Enhancing sensitivity of SPR sensors using nanostructured Au chips coated with functional plasma polymer nanofilms von Indutnyi, I.Z., Ushenin, Yu.V., Hegemann, D., Vandenbossche, M., Myn’ko, V.I., Shepeliavyi, P.E., Lukaniuk, M.V., Lytvyn, P.M., Khrystosenko, R.V.

Volltext

Formation of laterally ordered arrays of noble metal nanocavities for SERS substrates by using interference photolithography von Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Lytvyn, P.M., Lukaniuk, M.V., Bandarenka, H.V., Dolgyi, A.L., Redko, S.V.

Volltext

Features of mechanical scanning probe lithography on graphene oxide and As(Ge)Se chalcogenide resist von Lytvyn, P.M., Malyuta, S.V., Indutnyi, I.Z., Efremov, A.A., Slobodyan, O.V., Min’ko, V.I., Nazarov, A.N., Borysov, O.V., Prokopenko, I.V.

Volltext

Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist von Dan’ko, V.A., Dorozinsky, G.V., Indutnyi, I.Z., Myn’ko, V.I., Ushenin, Yu.V., Shepeliavyi, P.E., Lukaniuk, M.V., Korchovyi, A.A., Khrystosenko, R.V.

Volltext

Efficient SERS substrates based on laterally ordered gold nanostructures made using interference lithography von Hreshchuk, O.M., Yukhymchuk, V.O., Dzhagan, V.M., Danko, V.A., Min'ko, V.I., Indutnyi, I.Z., Shepeliavyi, P.Ye., Lytvyn, P.M., Sheregii, E., Prokhorenko, S., Polit, J., Zak, D., Płoch, D., Valakh, M.Ya.

Volltext