Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

von V. I. Popovych, A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, G. V. Lashkarov
Veröffentlicht 2016