Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

• Datum: 2016
• Hauptverfasser: V. I. Popovych, A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, G. V. Lashkarov
• Format: Artikel
• Sprache: English
• Veröffentlicht: 2016
• Schriftenreihe: Ukrainian journal of physics
• Online Zugang: http://jnas.nbuv.gov.ua/article/UJRN-0000727569
• Назва журналу: Library portal of National Academy of Sciences of Ukraine | LibNAS