Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering von D. V. Myroniuk, A. I. Ievtushenko, G. V. Lashkarev, V. T. Maslyuk, I. I. Timofeeva, V. A. Baturin, O. Y. Karpenko, V. M. Kuznetsov, M. V. Dranchuk

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Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering von V. I. Popovych, A. I. Yevtushenko, O. S. Lytvyn, V. R. Romaniuk, V. M. Tkach, V. A. Baturyn, Ye. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. H. Dusheiko, V. A. Karpyna, H. V. Lashkarov

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Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering von V. I. Popovych, A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, G. V. Lashkarov

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