Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering

by D. V. Myroniuk, A. I. Ievtushenko, G. V. Lashkarev, V. T. Maslyuk, I. I. Timofeeva, V. A. Baturin, O. Y. Karpenko, V. M. Kuznetsov, M. V. Dranchuk
Published 2015

Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

by V. I. Popovych, A. I. Yevtushenko, O. S. Lytvyn, V. R. Romaniuk, V. M. Tkach, V. A. Baturyn, Ye. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. H. Dusheiko, V. A. Karpyna, H. V. Lashkarov
Published 2016

Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

by V. I. Popovych, A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, G. V. Lashkarov
Published 2016