Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma

за авторством Reshetnyak, E.N.
Опубліковано 2014

Optimization of diamond-like carbon coatings for mechanical and tribological applications. Review

за авторством Reshetnyak, E.N., Luchaninov, A.A., Strel’nitskij, V.E.
Опубліковано 2023

Effect of time parameters of pulsed bias potential on intrinsic stress in TiN coating deposited from inclined ion beam

за авторством Kalinichenko, A.I., Perepelkin, S.S., Reshetnyak, E.N., Strel’nitskij, V.E.
Опубліковано 2018

Structure of polycrystalline diamond coatings deposited by СVD method in the plasma of glow discharge with the use of pulse power supply

за авторством Koshevoy, K.I., Volkov, Yu.Ya., Strel’nitskij, V.E., Reshetnyak, E.N.
Опубліковано 2021

Plasma streams mixing in two-channel T-shaped magnetic filter

за авторством Aksyonov, D.S., Aksenov, I.I., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E.
Опубліковано в: Вопросы атомной науки и техники (2011)

Structure and stress state of ion-plasma hafnium condensates

за авторством Vus, A.S., Malykhin, S.V., Pugachev, A.T., Reshetnyak, E.N., Azhazha, R.V., Kovtun, K.V.
Опубліковано 2007

Surface morphology and structure of nanocrystalline diamond films deposited in CH₄/H₂/Ar glow discharge plasma

за авторством Vyrovets, I.I., Gritsyna, V.I., Dudnik, S.F., Opalev, O.A., Reshetnyak, E.N., Strel'nitskiy, V.E.
Опубліковано 2009

Structure and properties of the (Cr, Al)N coatings deposited by PIII&D method

за авторством Vasyliev, V.V., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E., Lorentz, B., Reichert, S., Zavaleyev, V., Walkowicz, J., Sawczak, M.
Опубліковано 2016

Radiation resistance of Ti—20Zr alloy in microcrystalline and nanocrystalline state

за авторством Belous, V.A., Borodin, O.V., Bryk, V.V., Vasilenko, R.L., Voyevodin, V.N., Kuprin, A.S., Ovcharenko, V.D., Reshetnyak, E.N., Tolmachova, G.N.
Опубліковано 2013

Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage

за авторством Kuprin, A.S., Leonov, S.A., Ovcharenko, V.D., Reshetnyak, E.N., Belous, V.A., Vasilenko, R.L., Tolmachova, G.N., Kovalenko, V.I., Klimenko, I.O.
Опубліковано 2019

Effect of deuterium implantation dose on properties of CrN coatings

за авторством Kuprin, A.S., Belous, V.A., Morozov, O.M., Ovcharenko, V.D., Dub, S.N., Tolmachova, G.N., Reshetnyak, E.N., Zhurba, V.I., Progolaieva, V.O.
Опубліковано 2017