Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering von V. I. Popovych, A. I. Yevtushenko, O. S. Lytvyn, V. R. Romaniuk, V. M. Tkach, V. A. Baturyn, Ye. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. H. Dusheiko, V. A. Karpyna, H. V. Lashkarov

Volltext

Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering von V. I. Popovych, A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, G. V. Lashkarov

Volltext