Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering за авторством V. I. Popovych, A. I. Yevtushenko, O. S. Lytvyn, V. R. Romaniuk, V. M. Tkach, V. A. Baturyn, Ye. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. H. Dusheiko, V. A. Karpyna, H. V. Lashkarov

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Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering за авторством V. I. Popovych, A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, G. V. Lashkarov

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