Optoelectronic properties of thin hydrogenated a-Si1–xGex:H (x = 0ч1) films produced by plasma chemical deposition technique von B. A. Najafov, V. V. Dadashova

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Optoelectronic properties of thin hydrogenated a-Si1–xGex:H (x = 0ч1) films produced by plasma chemical deposition technique von B. A. Nadzhafov, V. V. Dadashova

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Optoelectronic properties of hydrogenated amorphous silicon–carbon and nanocrystalline-silicon thin films von B. A. Najafov, V. V. Dadashova

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Optoelectronic properties of hydrogenated amorphous silicon–carbon and nanocrystalline-silicon thin films von B. A. Nadzhafov, V. V. Dadashova

Volltext