Investigation of the process of microrelief structures formation in chromium films based on the method of chemical etching
Modern approaches used in the formation of microrelief structures on the surface of highly stable single-crystal substrates are considered. The priority of submicron photolithography methods, in particular, the use of plasma chemical etching with a multilayer mask is shown. The analysis of the techn...
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| Datum: | 2021 |
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| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | Ukrainian |
| Veröffentlicht: |
Інститут проблем реєстрації інформації НАН України
2021
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| Online Zugang: | http://drsp.ipri.kiev.ua/article/view/235022 |
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| Назва журналу: | Data Recording, Storage & Processing |