Automation of measurements of the rate of thin films chemical etching

• Date: 2024
• Main Authors: Іваницький, В. П., Рубіш, В. М., Тарнай, А. А., Чичура, І. І., Рубіш, В. В., Далекорей, А. В., Мешко, Р. О., Рябощук, М. М., Цигика, В. В.
• Format: Article
• Language: Ukrainian
• Published: Інститут проблем реєстрації інформації НАН України 2024
• Subjects: automation of chemical etching processes; chalcogenide amorphous films; photoresists; interference methods of thickness control
• Online Access: http://drsp.ipri.kiev.ua/article/view/316977
• Journal Title: Data Recording, Storage & Processing

The peculiarities of the interference method application for the processes of controlling the thin films thickness and measuring their etching rate are analyzed. The possibilities of complete automation of such processes during chemical etching of various types of substances have been investigated....