Automation of measurements of the rate of thin films chemical etching
The peculiarities of the interference method application for the processes of controlling the thin films thickness and measuring their etching rate are analyzed. The possibilities of complete automation of such processes during chemical etching of various types of substances have been investigated....
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| Datum: | 2024 |
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| Hauptverfasser: | , , , , , , , , |
| Format: | Artikel |
| Sprache: | Ukrainian |
| Veröffentlicht: |
Інститут проблем реєстрації інформації НАН України
2024
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| Online Zugang: | http://drsp.ipri.kiev.ua/article/view/316977 |
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| Назва журналу: | Data Recording, Storage & Processing |