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Automation of measurements of the rate of thin films chemical etching

The peculiarities of the interference method application for the processes of controlling the thin films thickness and measuring their etching rate are analyzed. The possibilities of complete automation of such processes during chemical etching of various types of substances have been investigated....

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Bibliographic Details
Main Authors:	Іваницький, В. П., Рубіш, В. М., Тарнай, А. А., Чичура, І. І., Рубіш, В. В., Далекорей, А. В., Мешко, Р. О., Рябощук, М. М., Цигика, В. В.
Format:	Article
Language:	Ukrainian
Published:	Інститут проблем реєстрації інформації НАН України 2024
Subjects:	automation of chemical etching processes chalcogenide amorphous films photoresists interference methods of thickness control
Online Access:	http://drsp.ipri.kiev.ua/article/view/316977
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Automation of measurements of the rate of thin films chemical etching

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