2025-02-22T23:49:12-05:00 DEBUG: VuFindSearch\Backend\Solr\Connector: Query fl=%2A&wt=json&json.nl=arrarr&q=id%3A%22irk-123456789-110976%22&qt=morelikethis&rows=5
2025-02-22T23:49:12-05:00 DEBUG: VuFindSearch\Backend\Solr\Connector: => GET http://localhost:8983/solr/biblio/select?fl=%2A&wt=json&json.nl=arrarr&q=id%3A%22irk-123456789-110976%22&qt=morelikethis&rows=5
2025-02-22T23:49:12-05:00 DEBUG: VuFindSearch\Backend\Solr\Connector: <= 200 OK
2025-02-22T23:49:12-05:00 DEBUG: Deserialized SOLR response
Deposition of TiO₂ thin films using atmospheric dielectric barrier discharge

Deposition of TiO₂ thin films using atmospheric dielectric barrier discharge

In this paper the influence of precursor (titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO₂ thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Argon was used as worki...

Full description

Saved in:
Bibliographic Details
Main Authors: Klenko, Y., Píchal, J.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2008
Series:Вопросы атомной науки и техники
Subjects:
Low temperature plasma and plasma technologies
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/110976
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

http://dspace.nbuv.gov.ua/handle/123456789/110976

Similar Items