Electrophysical properties of meso-porous silicon free standing films modified with palladium

Resistivity and complex impedance voltage dependences for thick mesoporous silicon free layers were studied in this work. The asymmetrical by the sign of applied voltage experimental curves at low frequencies have been obtained. Modification of electrophysical properties due to introduction of pa...

Повний опис

Збережено в:
Бібліографічні деталі
Дата:2011
Автори: Manilov, A.I., Skryshevsky, V.A., Alekseev, S.A., Kuznetsov, G.V.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/117603
Теги: Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-117603
record_format dspace
spelling irk-123456789-1176032017-05-26T03:03:42Z Electrophysical properties of meso-porous silicon free standing films modified with palladium Manilov, A.I. Skryshevsky, V.A. Alekseev, S.A. Kuznetsov, G.V. Resistivity and complex impedance voltage dependences for thick mesoporous silicon free layers were studied in this work. The asymmetrical by the sign of applied voltage experimental curves at low frequencies have been obtained. Modification of electrophysical properties due to introduction of palladium particles into the porous matrix is observed. Impedance change regularities during oxidation of the samples have been measured. The explanation of experimental results by asymmetrical distribution of charge carrier traps in the bulk of porous silicon has been suggested. Energy band diagrams and charge transfer mechanisms of these heterostructures are discussed. 2011 Article Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ. 1560-8034 PACS 61.72.uf, 72.80.Cw, 73.61.Cw http://dspace.nbuv.gov.ua/handle/123456789/117603 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Resistivity and complex impedance voltage dependences for thick mesoporous silicon free layers were studied in this work. The asymmetrical by the sign of applied voltage experimental curves at low frequencies have been obtained. Modification of electrophysical properties due to introduction of palladium particles into the porous matrix is observed. Impedance change regularities during oxidation of the samples have been measured. The explanation of experimental results by asymmetrical distribution of charge carrier traps in the bulk of porous silicon has been suggested. Energy band diagrams and charge transfer mechanisms of these heterostructures are discussed.
format Article
author Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
spellingShingle Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
Electrophysical properties of meso-porous silicon free standing films modified with palladium
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
author_sort Manilov, A.I.
title Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_short Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_full Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_fullStr Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_full_unstemmed Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_sort electrophysical properties of meso-porous silicon free standing films modified with palladium
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2011
url http://dspace.nbuv.gov.ua/handle/123456789/117603
citation_txt Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT manilovai electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
AT skryshevskyva electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
AT alekseevsa electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
AT kuznetsovgv electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
first_indexed 2023-10-18T20:30:11Z
last_indexed 2023-10-18T20:30:11Z
_version_ 1796150369136410624