Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing

The experimental data on Raman scattering (RS) and optical absorption in structures with thin silicon layers on various substrates, as well as in multilayer quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is shown that laser annealing on the above structures lea...

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Дата:2014
Автор: Okhrimenko, O.B.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/118373
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-118373
record_format dspace
spelling irk-123456789-1183732017-05-31T03:07:07Z Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing Okhrimenko, O.B. The experimental data on Raman scattering (RS) and optical absorption in structures with thin silicon layers on various substrates, as well as in multilayer quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is shown that laser annealing on the above structures leads to changes in spectra of RS and optical transmission that can be explained within the critical action model. The value of critical action of laser radiation is determined for the structures studied. 2014 Article Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ. 1560-8034 PACS 71.20.Nr, 78.40.Fy http://dspace.nbuv.gov.ua/handle/123456789/118373 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The experimental data on Raman scattering (RS) and optical absorption in structures with thin silicon layers on various substrates, as well as in multilayer quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is shown that laser annealing on the above structures leads to changes in spectra of RS and optical transmission that can be explained within the critical action model. The value of critical action of laser radiation is determined for the structures studied.
format Article
author Okhrimenko, O.B.
spellingShingle Okhrimenko, O.B.
Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Okhrimenko, O.B.
author_sort Okhrimenko, O.B.
title Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_short Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_full Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_fullStr Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_full_unstemmed Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_sort variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2014
url http://dspace.nbuv.gov.ua/handle/123456789/118373
citation_txt Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT okhrimenkoob variationofopticalparametersofmultilayerstructureswiththinsiliconlayersatlaserannealing
first_indexed 2023-10-18T20:31:59Z
last_indexed 2023-10-18T20:31:59Z
_version_ 1796150448271392768