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Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire

Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...

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Bibliographic Details
Main Author: Vovk, E.A.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2015
Series:Functional Materials
Subjects:
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/119306
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