Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire

Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...

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Дата:2015
Автор: Vovk, E.A.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2015
Назва видання:Functional Materials
Теми:
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/119306
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1193062017-06-06T03:02:46Z Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire Vovk, E.A. Technology Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830. 2015 Article Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. 1027-5495 DOI: http://dx.doi.org/10.15407/fm22.01.110 http://dspace.nbuv.gov.ua/handle/123456789/119306 en Functional Materials НТК «Інститут монокристалів» НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
topic Technology
Technology
spellingShingle Technology
Technology
Vovk, E.A.
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
Functional Materials
description Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830.
format Article
author Vovk, E.A.
author_facet Vovk, E.A.
author_sort Vovk, E.A.
title Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
title_short Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
title_full Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
title_fullStr Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
title_full_unstemmed Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
title_sort deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
publisher НТК «Інститут монокристалів» НАН України
publishDate 2015
topic_facet Technology
url http://dspace.nbuv.gov.ua/handle/123456789/119306
citation_txt Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ.
series Functional Materials
work_keys_str_mv AT vovkea deagglomerationofaerosilinpolishingsuspensionforchemicalmechanicalpolishingofsapphire
first_indexed 2023-10-18T20:34:14Z
last_indexed 2023-10-18T20:34:14Z
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