Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...
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Дата: | 2015 |
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Автор: | |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
НТК «Інститут монокристалів» НАН України
2015
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Назва видання: | Functional Materials |
Теми: | |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/119306 |
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Цитувати: | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. |
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irk-123456789-1193062017-06-06T03:02:46Z Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire Vovk, E.A. Technology Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830. 2015 Article Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. 1027-5495 DOI: http://dx.doi.org/10.15407/fm22.01.110 http://dspace.nbuv.gov.ua/handle/123456789/119306 en Functional Materials НТК «Інститут монокристалів» НАН України |
institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
collection |
DSpace DC |
language |
English |
topic |
Technology Technology |
spellingShingle |
Technology Technology Vovk, E.A. Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire Functional Materials |
description |
Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830. |
format |
Article |
author |
Vovk, E.A. |
author_facet |
Vovk, E.A. |
author_sort |
Vovk, E.A. |
title |
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
title_short |
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
title_full |
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
title_fullStr |
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
title_full_unstemmed |
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
title_sort |
deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
publisher |
НТК «Інститут монокристалів» НАН України |
publishDate |
2015 |
topic_facet |
Technology |
url |
http://dspace.nbuv.gov.ua/handle/123456789/119306 |
citation_txt |
Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. |
series |
Functional Materials |
work_keys_str_mv |
AT vovkea deagglomerationofaerosilinpolishingsuspensionforchemicalmechanicalpolishingofsapphire |
first_indexed |
2023-10-18T20:34:14Z |
last_indexed |
2023-10-18T20:34:14Z |
_version_ |
1796150539934760960 |