Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures
The high-planar epitaxial layers of n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇ quaternary solid solutions, lattice matched with {111}BaF2 substrates, have been grown from bounded volume of supersaturated melt-solutions in the growth temperature region 773-873 K by the liquid phase epitaxy technique at a program...
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Дата: | 2002 |
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Мова: | English |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2002
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Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/119567 |
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Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures / A.I. Tkachuk, O.N. Tsarenko, S.I. Ryabets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 1. — С. 51-57. — Бібліогр.: 20 назв. — англ. |
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irk-123456789-1195672017-06-08T03:02:28Z Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures Tkachuk, A.I. Tsarenko, O.N. Ryabets, S.I. The high-planar epitaxial layers of n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇ quaternary solid solutions, lattice matched with {111}BaF2 substrates, have been grown from bounded volume of supersaturated melt-solutions in the growth temperature region 773-873 K by the liquid phase epitaxy technique at a programmatic refrigeration rate of 0.1-0.2 K/min and a temperature reduction range of DT=5-10 K. The laboratory methodology of the production of Cu/δ-layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇ /In Schottky barrier structures by thermal vacuum deposition has been developed. The current- and farad-voltage characteristics of these structures have been measured at the 77 K, and the dependence of the diode electro-physical properties on the δ-layer width has been studied. 2002 Article Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures / A.I. Tkachuk, O.N. Tsarenko, S.I. Ryabets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 1. — С. 51-57. — Бібліогр.: 20 назв. — англ. 1560-8034 PACS: 73.20.-r, 73.30.+y,73.40.Lq http://dspace.nbuv.gov.ua/handle/123456789/119567 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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DSpace DC |
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English |
description |
The high-planar epitaxial layers of n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇ quaternary solid solutions, lattice matched with {111}BaF2 substrates, have been grown from bounded volume of supersaturated melt-solutions in the growth temperature region 773-873 K by the liquid phase epitaxy technique at a programmatic refrigeration rate of 0.1-0.2 K/min and a temperature reduction range of DT=5-10 K. The laboratory methodology of the production of Cu/δ-layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇ /In Schottky barrier structures by thermal vacuum deposition has been developed. The current- and farad-voltage characteristics of these structures have been measured at the 77 K, and the dependence of the diode electro-physical properties on the δ-layer width has been studied. |
format |
Article |
author |
Tkachuk, A.I. Tsarenko, O.N. Ryabets, S.I. |
spellingShingle |
Tkachuk, A.I. Tsarenko, O.N. Ryabets, S.I. Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures Semiconductor Physics Quantum Electronics & Optoelectronics |
author_facet |
Tkachuk, A.I. Tsarenko, O.N. Ryabets, S.I. |
author_sort |
Tkachuk, A.I. |
title |
Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures |
title_short |
Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures |
title_full |
Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures |
title_fullStr |
Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures |
title_full_unstemmed |
Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures |
title_sort |
production and investigation of cu/thin intermediate tunnel-transparent dielectric oxide layer/n-pb₀.₉₃₅sn₀.₀₆₅te₀.₂₄₃se₀.₇₅₇/in schottky barrier structures |
publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
publishDate |
2002 |
url |
http://dspace.nbuv.gov.ua/handle/123456789/119567 |
citation_txt |
Production and investigation of Cu/thin intermediate tunnel-transparent dielectric oxide layer/n-Pb₀.₉₃₅Sn₀.₀₆₅Te₀.₂₄₃Se₀.₇₅₇/In Schottky barrier structures / A.I. Tkachuk, O.N. Tsarenko, S.I. Ryabets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 1. — С. 51-57. — Бібліогр.: 20 назв. — англ. |
series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
work_keys_str_mv |
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first_indexed |
2023-10-18T20:34:53Z |
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2023-10-18T20:34:53Z |
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