Conductivity of the Bi₁₂SiO₂₀ thin films

The results of the conductivity examination in the Bi₁₂SiO₂₀ thin films prepared using the sol-gel method are presented. The conductivity was investigated in the 300–550 K temperature and up to 100 V/cm field ranges. It was observed that the charge carrier transfer at the flow level, situated in the...

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Бібліографічні деталі
Дата:1999
Автори: Plyaka, S.N., Sokolyanskii, G.Ch., Klebanskii, E.O., Sadovskaya, L.Ja.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики конденсованих систем НАН України 1999
Назва видання:Condensed Matter Physics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/120588
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Conductivity of the Bi₁₂SiO₂₀ thin films / S.N. Plyaka, G.Ch. Sokolyanskii, E.O. Klebanskii, L.Ja. Sadovskaya // Condensed Matter Physics. — 1999. — Т. 2, № 4(20). — С. 625-630. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Резюме:The results of the conductivity examination in the Bi₁₂SiO₂₀ thin films prepared using the sol-gel method are presented. The conductivity was investigated in the 300–550 K temperature and up to 100 V/cm field ranges. It was observed that the charge carrier transfer at the flow level, situated in the tail of the density of states into the forbidden band is dominant for the investigated sample at T > 500 K. The obtained results are explained in terms of the highly compensated doped semiconductor model.