Light absorption by inhomogeneous semiconductor film

Processes of light absorption by thin semiconductor film in the framework of local-field method are studied. The film is inhomogeneously implanted with O⁺ ions. A distribution of implanted layer is characterized by different profiles. The effective susceptibility (response to the external field) and...

Повний опис

Збережено в:
Бібліографічні деталі
Дата:2005
Автори: Baraban, L., Lozovski, V.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/120971
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Light absorption by inhomogeneous semiconductor film / L. Baraban, V. Lozovski // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 66-73. — Бібліогр.: 24 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Опис
Резюме:Processes of light absorption by thin semiconductor film in the framework of local-field method are studied. The film is inhomogeneously implanted with O⁺ ions. A distribution of implanted layer is characterized by different profiles. The effective susceptibility (response to the external field) and dissipative function of inhomogeneous in thickness semiconductor film were calculated. The absorption spectra are numerically calculated as a function of the frequency and angle of incidence. It was obtain that light absorption spectra are strongly dependent on profile distributions of implanted impurities along the film thickness.