Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film

We propose a phenomenological model that explains the changes in the optical spectra of the structures wide gap semiconductor – oxide film, which takes place as a result of short-term microwave treatment. To explain the specific athermal microwave exposure, proposed was an integrated approach that i...

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Дата:2015
Автор: Okhrimenko, O.B
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2015
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/121274
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 452-455. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1212742017-06-14T03:07:03Z Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film Okhrimenko, O.B We propose a phenomenological model that explains the changes in the optical spectra of the structures wide gap semiconductor – oxide film, which takes place as a result of short-term microwave treatment. To explain the specific athermal microwave exposure, proposed was an integrated approach that is a combination of several processes that are described by various models. Interaction of processes caused by the resonant interaction of microwave radiation with the intrinsic oscillations of dislocations, which can lead to dislocation motion, has been considered. The length of dislocations, for which the condition of the resonant interaction is fulfilled, has been estimated. It has been shown that the combination of the considered processes can lead to appearance of additional centers of light absorption or scattering, which is manifested in the spectra of optical absorption and photoluminescence of the structures wide-gap semiconductor – oxide film 2015 Article Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 452-455. — Бібліогр.: 13 назв. — англ. 1560-8034 DOI: 10.15407/spqeo18.04.452 PACS 61.72.Ff, 68.35.-p, 78.70.Gq http://dspace.nbuv.gov.ua/handle/123456789/121274 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description We propose a phenomenological model that explains the changes in the optical spectra of the structures wide gap semiconductor – oxide film, which takes place as a result of short-term microwave treatment. To explain the specific athermal microwave exposure, proposed was an integrated approach that is a combination of several processes that are described by various models. Interaction of processes caused by the resonant interaction of microwave radiation with the intrinsic oscillations of dislocations, which can lead to dislocation motion, has been considered. The length of dislocations, for which the condition of the resonant interaction is fulfilled, has been estimated. It has been shown that the combination of the considered processes can lead to appearance of additional centers of light absorption or scattering, which is manifested in the spectra of optical absorption and photoluminescence of the structures wide-gap semiconductor – oxide film
format Article
author Okhrimenko, O.B
spellingShingle Okhrimenko, O.B
Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Okhrimenko, O.B
author_sort Okhrimenko, O.B
title Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_short Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_full Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_fullStr Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_full_unstemmed Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_sort phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2015
url http://dspace.nbuv.gov.ua/handle/123456789/121274
citation_txt Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 452-455. — Бібліогр.: 13 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT okhrimenkoob phenomenologicalmodelofathermalinteractionofmicrowaveradiationwiththestructureswidegapsemiconductoroxidefilm
first_indexed 2023-10-18T20:39:03Z
last_indexed 2023-10-18T20:39:03Z
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