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2025-02-22T16:36:35-05:00 DEBUG: VuFindSearch\Backend\Solr\Connector: => GET http://localhost:8983/solr/biblio/select?fl=%2A&wt=json&json.nl=arrarr&q=id%3A%22irk-123456789-121489%22&qt=morelikethis&rows=5
2025-02-22T16:36:35-05:00 DEBUG: VuFindSearch\Backend\Solr\Connector: <= 200 OK
2025-02-22T16:36:35-05:00 DEBUG: Deserialized SOLR response
Stamp stress analysis with low temperature nanoimprint lithography

Stamp stress analysis with low temperature nanoimprint lithography

High temperature nanoimprint lithography has the drawback of long process cycle, demoulding difficulty, polymer degradation, thermal stress. Low temperature nanoimprint lithography (LTNIL) can avoid these problems. LTNIL is also ideal for manufacturing biological compatibility samples since the samp...

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Bibliographic Details
Main Authors: Hongwen Sun, Xiaochao Ma, Chenhui Hu
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2016
Series:Functional Materials
Subjects:
Technology
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/121489
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http://dspace.nbuv.gov.ua/handle/123456789/121489

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