Effect of low-energy ion bombardment during the sputtering on the crystal structure of FePt films

• Дата: 2008
• Автори: Naumov, V.V., Il'yashenko, E.I.
• Формат: Стаття
• Мова: English
• Опубліковано: НТК «Інститут монокристалів» НАН України 2008
• Назва видання: Functional Materials
• Теми: Characterization and properties
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/135266
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Effect of low-energy ion bombardment during the sputtering on the crystal structure of FePt films // V.V. Naumov, E.I. Il'yashenko // Functional Materials. — 2008. — Т. 15, № 3. — С. 356-363. — Бібліогр.: 4 назв. — англ.

The crystal structure and texture of FePt films have been studied. The film were grown on Si and Al₂O₃ substrates by RF magnetron sputtering using ion bombardment during the growth. The ion bombardment was done by applying an RF bias to the substrate. At room temperature of substrate, the effect of...