Surface morphology and structure of nanocrystalline diamond films deposited in CH₄/H₂/Ar glow discharge plasma

• Дата: 2009
• Автори: Vyrovets, I.I., Gritsyna, V.I., Dudnik, S.F., Opalev, O.A., Reshetnyak, E.N., Strel'nitskiy, V.E.
• Формат: Стаття
• Мова: English
• Опубліковано: НТК «Інститут монокристалів» НАН України 2009
• Назва видання: Functional Materials
• Теми: Characterization and properties
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/137726
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Surface morphology and structure of nanocrystalline diamond films deposited in CH₄/H₂/Ar glow discharge plasma // I.I. Vyrovets, V.I. Gritsyna, S.F. Dudnik, O.A. Opalev, E.N. Reshetnyak, V.E. Strel'nitskiy // Functional Materials. — 2009. — Т. 16, № 2. — С. 155-160. — Бібліогр.: 13 назв. — англ.

Diamond films of up to 12 μm thickness have been deposited onto single crystal silicon substrates by CVD method in CH₄/H₂/Ar glow discharge plasma stabilized by magnetic field. X-ray diffraction analysis and atomic force microscopy have shown the films consist of about 1 μm in diameter conglomerates...