Photoluminescence and electrophysical properties of p-type ZnO layers implanted with V Group elements
Ion implantation of arsenic and nitrogen into zinc oxide film (As and N being acceptor impurities in ZnO) has been shown to result in formation of the hole conductivity only if the film is annealed in the presence of oxygen radicals. The ion implantation and sub- sequent anneal influence no...
Збережено в:
| Дата: | 2005 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2005
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| Назва видання: | Functional Materials |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/138871 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Photoluminescence and electrophysical properties of p-type ZnO layers implanted with V Group elements / M.B. Kotlyarevsky, I.V. Rogozin, O.V. Marakhovsky // Functional Materials. — 2005. — Т. 12, № 4. — С. 616-621. — Бібліогр.: 19 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | Ion implantation of arsenic and nitrogen into zinc oxide film (As and N being acceptor impurities in ZnO) has been shown to result in formation of the hole conductivity only if the film is annealed in the presence of oxygen radicals. The ion implantation and sub- sequent anneal influence not only the electric properties but also the photoluminescence spectra of ZnO:Ga:As⁺ (ZnO:Ga:N⁺) layers. The luminescence bands due to As and N introduction appear in the UV and visible spectral regions. |
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