Si as dopant impurity in CdTe
CdTe<Si> single crystals have been investigated by high-temperature Hall effect meas- urements under Cd vapor pressure in 200-900 ℃ temperature range. Basing on the experimental results, the Si solubility in CdTe at 500-600 ℃ has been supposed to be lower than ≈ 3*10¹⁶ at/cm . The Si segregati...
Збережено в:
| Дата: | 2005 |
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| Автори: | , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2005
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| Назва видання: | Functional Materials |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/139311 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Si as dopant impurity in CdTe / P.M. Fochuk, O.E. Panchuk // Functional Materials. — 2005. — Т. 12, № 4. — С. 771-774. — Бібліогр.: 8 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | CdTe<Si> single crystals have been investigated by high-temperature Hall effect meas- urements under Cd vapor pressure in 200-900 ℃ temperature range. Basing on the experimental results, the Si solubility in CdTe at 500-600 ℃ has been supposed to be lower than ≈ 3*10¹⁶ at/cm . The Si segregation coefficient in CdTe is exceeds unity (kₛₑᵣᵍ > 1). This peculiarity of Si behavior in CdTe differs it from other IVA group elements. At high Si content in CdTe (~ 10¹⁷ at/cm³), it is mainly contained in precipitates. Their dissolution starts at Т ~ 500 ℃ and the subsequent cooling does not reduce the concentration of
electrically active Si form. The dominating Si point defect is Si+ᶜᵈ , although a certain
fraction of this impurity forms associates (Si+ᶜᵈ V²⁻ᶜᵈ ). |
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