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Сharging of a macroparticle in cathodic arc sheath

Сharging of a macroparticle in cathodic arc sheath

The macroparticle (MP) contamination is the most important technological problem of cathodic vacuum arc deposition of coatings. The electrostatic reflection of MP from the substrate is considered as a possible reason for the reduction in number of MPs in the presence of reactive gas. It is shown t...

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Bibliographic Details
Main Authors: Romashchenko, E.V., Bizyukov, A.A., Girka, I.О.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2018
Series:Вопросы атомной науки и техники
Subjects:
Плазменно-пучковый разряд, газовый разряд и плазмохимия
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/147354
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http://dspace.nbuv.gov.ua/handle/123456789/147354

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