Сharging of a macroparticle in cathodic arc sheath
The macroparticle (MP) contamination is the most important technological problem of cathodic vacuum arc deposition of coatings. The electrostatic reflection of MP from the substrate is considered as a possible reason for the reduction in number of MPs in the presence of reactive gas. It is shown t...
Збережено в:
| Дата: | 2018 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2018
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/147354 |
| Теги: |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Сharging of a macroparticle in cathodic arc sheath / E.V. Romashchenko, A.A. Bizyukov, I.О. Girka // Вопросы атомной науки и техники. — 2018. — № 4. — С. 176-180. — Бібліогр.: 27 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | The macroparticle (MP) contamination is the most important technological problem of cathodic vacuum arc
deposition of coatings. The electrostatic reflection of MP from the substrate is considered as a possible reason for
the reduction in number of MPs in the presence of reactive gas. It is shown that the probability of the electrostatic
reflection increases with increasing the nitrogen pressure due to expansion of the region in the sheath where MP
charge is negative. The MP charge in the collisional plasma sheath is calculated taking into account the dependence
of the charge state of ions, ion fluxes and ion energies on the background gas pressure. |
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