The microplasma aluminum and titanium oxidation in condensed environments

• Дата: 2020
• Автори: Vinnikov, D.V., Ozerov, A.N., Yuferov, V.B., Fomin, V.T.
• Формат: Стаття
• Мова: English
• Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2020
• Назва видання: Вопросы атомной науки и техники
• Теми: Physics and the technology of construction materials
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/194754
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: The microplasma aluminum and titanium oxidation in condensed environments / D.V. Vinnikov, A.N. Ozerov, V.B. Yuferov, V.T. Fomin // Problems of atomic science and tecnology. — 2020. — № 1. — С. 178-184. — Бібліогр.: 7 назв. — англ.

The plant intended for the microplasma oxidation of the materials whose oxides possess semiconductor properties has been developed. The coatings consisting of corundum Al²O³-α (hexagonal syngony) and the two transition modifications of aluminum oxide Al²O³-η (cubic syngony) and Al²O³-θ (monoclinic syngony) were cultivated by the aluminum substrate. The crystals in the form of anatase and rutile oxides (tetragonal syngony) were grown by the titanium substrate. The Al hardness was increased from 81 tо 97 as for the HRB scale. The adhesion force for the aluminum substrate ranged from HF1 to HF3, and for the titanium substrate it was HF3. The coating morphology was established. The coatings were applied on aluminum items. The promising fields of application were defined.