Application of pulse power supply for diamond coatings deposition in glow discharge plasma
Comparative studies of diamond coatings deposition have been carried out in the glow discharge plasma stabilized by a magnetic field in methane-hydrogen medium with using the DC or pulse power supply. It was shown that using of a pulsed power supply leads to an increase of the input power range at w...
Збережено в:
| Дата: | 2019 |
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| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2019
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/194829 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Application of pulse power supply for diamond coatings deposition in glow discharge plasma / K.I. Koshevoy, Yu.Ya. Volkov, V.E. Strel’nitskij, E.N. Reshetnyak // Problems of atomic science and technology. — 2019. — № 1. — С. 197-200. — Бібліогр.: 10 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | Comparative studies of diamond coatings deposition have been carried out in the glow discharge plasma stabilized by a magnetic field in methane-hydrogen medium with using the DC or pulse power supply. It was shown that using of a pulsed power supply leads to an increase of the input power range at which the discharge is stable in comparison with DC one. In addition a significant increase of the samples temperature and the diamond coating growth rate were achieved at the same average power introduced into the discharge. The resulting diamond coating was of high quality and purity. |
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