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Effect of pulsed substrate biasing on macroparticle in vacuum arc

Effect of pulsed substrate biasing on macroparticle in vacuum arc

An analytical model of the interaction of macroparticle (MP) with vacuum arc plasma in plasma immersion ion implantation (PIII) is presented. The proposed model is based on combination of the theory of charge dynamics of MP and sheath model for PIII. In the framework of this model, the MP charge dyn...

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Bibliographic Details
Main Authors: Romashchenko, E.V., Bizyukov, A.A., Girka, I.О.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2019
Series:Вопросы атомной науки и техники
Subjects:
Gas and plasma-beam discharges and their applications
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/195192
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http://dspace.nbuv.gov.ua/handle/123456789/195192

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