Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macropa...
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| Дата: | 2019 |
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| Автори: | , , , , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2019
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/195216 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ. |
Репозитарії
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irk-123456789-1952162023-12-03T17:30:52Z Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. Physics of radiotechnology and ion-plasma technologies The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated. Представлені результати дослідження впливу високої напруги зсуву підкладки від 300 до 1300 В на осадження покриттів нітриду титану при тиску азоту 2 Па. Вивчені швидкість осадження, фазовий і хімічний склад, адгезія і механічні властивості покриттів, кількість і розподіл за розмірами макрочасток. Представлены результаты исследования влияния высокого напряжения смещения подложки от 300 до 1300 В на осаждение покрытий нитрида титана при давлении азота 2 Па. Изучены скорость осаждения, фазовый и химический составы, адгезия и механические свойства покрытий, количество и распределение по размерам макрочастиц. 2019 Article Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ. 1562-6016 http://dspace.nbuv.gov.ua/handle/123456789/195216 669.056.9 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Physics of radiotechnology and ion-plasma technologies Physics of radiotechnology and ion-plasma technologies |
| spellingShingle |
Physics of radiotechnology and ion-plasma technologies Physics of radiotechnology and ion-plasma technologies Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage Вопросы атомной науки и техники |
| description |
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated. |
| format |
Article |
| author |
Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. |
| author_facet |
Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. |
| author_sort |
Kuprin, A.S. |
| title |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_short |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_full |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_fullStr |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_full_unstemmed |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_sort |
deposition of tin-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2019 |
| topic_facet |
Physics of radiotechnology and ion-plasma technologies |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/195216 |
| citation_txt |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ. |
| series |
Вопросы атомной науки и техники |
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2024-03-31T09:14:50Z |
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