Influence of surface pre-heating on the nitriding depth of steel 25CrMoVA used complex ion-plasma treatment von Belous, V.A., Zadneprovskiy, Yu.A., Domnich, I.S.

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Combined vacuum-arc hardening of frictional unit components von Belous, V.A., Yermolenko, I.G., Zadneprovsky, Yu.A., Lomino, N.S.

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Features of synthesis of Ti-Si-N coatings by condensation of vacuum arc plasma with a composite cathode von Aksenov, I.I., Belous, V.A., Zadneprovskiy, Yu.A., Lomino, N.S., Sobol, O.V.

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Thermophysical properties of fuel clading with various vacuum-arc coatings von Belous, V.A., Sokolenko, V.I., Chupikov, A.A., Kuprin, A.S., Ledenyov, O.P., Ovcharenko, V.D.

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Surface morphology and sputtering of FeCrAl coating on steel exposed to low-energy deuterium plasmas von Voyevodin, V.N., Tolstolutskaya, G.D., Nikitin, A.V., Vasilenko, R.L., Kuprin, A.S., Belous, V.A., Ovcharenko, V.D.

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Role of surface layer nanosrtucturing in improving mechanical and corrosion properties of reactor materials von Ozhigov, L.S., Belous, V.A., Savchenko, V.I., Nosov, G.I., Ovcharenko, V.D., Tolmachova, G.N., Kuprin, A.S., Goltvyanitsa, V.S.

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Erosion behavior of W-Ta coatings in plasmas of stationary mirror Penning discharges von Belous, V.A., Bondarenko, M.N., Glazunov, G.P., Ilchenko, A.V., Kuprin, A.S., Konotopskiy, A.L., Lunyov, V.M., Ovcharenko, V.D.

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Blistering of W, Ta and W-Ta coatings under the influence of particles of low-energy hydrogen plazma von Tolstolutskaya, G.D., Kuprin, A.S., Voyevodin, V.N., Nikitin, A.V., Ovcharenko, V.D., Belous, V.A., Vasilenko, R.L., Kopanets, I.E.

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Radiation resistance of Ti—20Zr alloy in microcrystalline and nanocrystalline state von Belous, V.A., Borodin, O.V., Bryk, V.V., Vasilenko, R.L., Voyevodin, V.N., Kuprin, A.S., Ovcharenko, V.D., Reshetnyak, E.N., Tolmachova, G.N.

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Effect of deuterium implantation dose on properties of CrN coatings von Kuprin, A.S., Belous, V.A., Morozov, O.M., Ovcharenko, V.D., Dub, S.N., Tolmachova, G.N., Reshetnyak, E.N., Zhurba, V.I., Progolaieva, V.O.

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Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage von Kuprin, A.S., Leonov, S.A., Ovcharenko, V.D., Reshetnyak, E.N., Belous, V.A., Vasilenko, R.L., Tolmachova, G.N., Kovalenko, V.I., Klimenko, I.O.

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